JPH0418658U - - Google Patents
Info
- Publication number
- JPH0418658U JPH0418658U JP5988490U JP5988490U JPH0418658U JP H0418658 U JPH0418658 U JP H0418658U JP 5988490 U JP5988490 U JP 5988490U JP 5988490 U JP5988490 U JP 5988490U JP H0418658 U JPH0418658 U JP H0418658U
- Authority
- JP
- Japan
- Prior art keywords
- sample
- chamber
- plasma processing
- heat treatment
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000005530 etching Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5988490U JPH0418658U (en]) | 1990-06-06 | 1990-06-06 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5988490U JPH0418658U (en]) | 1990-06-06 | 1990-06-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0418658U true JPH0418658U (en]) | 1992-02-17 |
Family
ID=31586776
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5988490U Pending JPH0418658U (en]) | 1990-06-06 | 1990-06-06 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0418658U (en]) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05315359A (ja) * | 1992-05-06 | 1993-11-26 | Casio Comput Co Ltd | 薄膜トランジスタ構成膜の成膜方法及び成膜装置 |
| JP2010135849A (ja) * | 2003-06-24 | 2010-06-17 | Tokyo Electron Ltd | 被処理体処理装置の圧力制御方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6360529A (ja) * | 1986-09-01 | 1988-03-16 | Hitachi Ltd | プラズマ処理方法 |
| JPH01104773A (ja) * | 1987-10-14 | 1989-04-21 | Sumitomo Electric Ind Ltd | 被覆切削工具 |
| JPH01313934A (ja) * | 1988-06-14 | 1989-12-19 | Matsushita Electric Ind Co Ltd | プラズマエッチング装置及びその方法 |
| JPH02247384A (ja) * | 1989-03-20 | 1990-10-03 | Sony Corp | Ｃｖｄ方法 |
-
1990
- 1990-06-06 JP JP5988490U patent/JPH0418658U/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6360529A (ja) * | 1986-09-01 | 1988-03-16 | Hitachi Ltd | プラズマ処理方法 |
| JPH01104773A (ja) * | 1987-10-14 | 1989-04-21 | Sumitomo Electric Ind Ltd | 被覆切削工具 |
| JPH01313934A (ja) * | 1988-06-14 | 1989-12-19 | Matsushita Electric Ind Co Ltd | プラズマエッチング装置及びその方法 |
| JPH02247384A (ja) * | 1989-03-20 | 1990-10-03 | Sony Corp | Ｃｖｄ方法 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05315359A (ja) * | 1992-05-06 | 1993-11-26 | Casio Comput Co Ltd | 薄膜トランジスタ構成膜の成膜方法及び成膜装置 |
| JP2010135849A (ja) * | 2003-06-24 | 2010-06-17 | Tokyo Electron Ltd | 被処理体処理装置の圧力制御方法 |